High‑NA EUV's reduced field size is driving new innovation in optical proximity correction and mask synthesis.

Semiconductor Engineering sat down to discuss lithography and photomask technologies with Gregory McIntyre, director of the Advanced Patterning Department at Imec; Harry Levinson, senior fellow and ...

VELDHOVEN, the Netherlands--(BUSINESS WIRE)--Brion Technologies, a division of ASML, today announces a new product for semiconductor manufacturers who need the most powerful computational lithography ...

2. The 3D mask gives the appearance of a V-shaped face The clean, 3D form didn’t come about by chance. Tokujin achieved this “simple, beautiful, and functional” design after testing more than 100 ...